Research Article

Fabrication and Characterization of Hydrophilic TiO2 Thin Films on Unheated Substrates Prepared by Pulsed DC Reactive Magnetron Sputtering

Figure 3

(a) Spectroscopic ellipsometry measurement and (b) FE-SEM cross-section image of an as grown T i O 2 thin film deposited on a Si substrate at an operating pressure of 10 mTorr.
841659.fig.003a
(a)
841659.fig.003b
(b)