Fabrication and Characterization of Hydrophilic TiO2 Thin Films on Unheated Substrates Prepared by Pulsed DC Reactive Magnetron Sputtering
Figure 3
(a) Spectroscopic ellipsometry measurement and (b) FE-SEM cross-section image of an as grown thin film deposited on a Si substrate at an operating pressure of 10 mTorr.