Fabrication and Characterization of Hydrophilic TiO₂ Thin Films on Unheated Substrates Prepared by Pulsed DC Reactive Magnetron Sputtering

Figure 5

FE-SEM surface images of TiO₂ films deposited on Si substrates at different thicknesses (a) 40, (b) 85, (c) 120, and (d) 150 nm (samples B–E).

(a)

(b)

(c)

(d)