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Journal of Nanomaterials
Volume 2011 (2011), Article ID 279686, 7 pages
Research Article

Angular Distribution of Damping Coefficient of Ablated Particle in Pure He, Ne, and Ar Gases

College of Physics Science and Technology, Hebei University, Baoding 071002, Hebei, China

Received 5 June 2011; Revised 26 July 2011; Accepted 26 July 2011

Academic Editor: Gong Ru Lin

Copyright © 2011 Yinglong Wang et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.


To investigate the angular distribution of damping coefficient of ablated particle under various ambient gases, nanocrystalline silicon films are systemically deposited on a circular substrate by pulse laser ablation in pure He, Ne, and Ar gases, respectively. Scanning electron microscopy images and Raman and X-ray diffraction spectra indicate that the average size of Si nanoparticles decreases with the increase of the departure angle between the film and the plume, and Ne gas induces the smallest and most uniform Si nanoparticles in size among all the three gases. Further theoretical simulation demonstrates the bigger the departure angle, the smaller the damping coefficient of ablated particle, and the damping coefficient in Ne gas is largest for the same angle, implying the most effective energy transfer between Si and ambient atoms.