810879.fig.003a
(a)
810879.fig.003b
(b)
810879.fig.003c
(c)
810879.fig.003d
(d)
Figure 3: HRTEM images with different post-deposition annealing temperatures from (a) 850°C; (b) 900°C; (c) 950°C; (d) 1000°C in an n-Si/SiO2/HfO2/ R u O 𝑥 /Al2O3/Pt capacitor.