Influence of Annealing and UV Irradiation on Hydrophilicity of Ag-TiO_𝟐 Nanostructured Thin Films

Figure 3

AFM images of Ag-TiO₂ films on silicon substrate (a) as-deposited and annealed at 900°C for (b) 15, (c) 30, (d) 60, (e) 90, and (f) 120 min.

(a)

(b)

(c)

(d)

(e)

(f)