Effects of Additional Oxygen Flow on the Optical and Electrical Properties of Ion Beam Sputtering Deposited Molybdenum-Doped Zinc Oxide Layer

<table class="table-group" id="tab2"><tr><td><table class="table"><tr><td class="thead-hr" colspan="2"><hr/></td></tr><tr class="thead"><td align="left">Parameter</td><td align="center">Composition, setting</td></tr><tr><td class="thead-hr" colspan="2"><hr/></td></tr><tr><td align="left">Target material</td><td align="center">ZnO/MoO<sub>3</sub> (97/3 wt%)</td></tr><tr><td align="left">Working pressure (Pa)</td><td align="center">0.5</td></tr><tr><td align="left">Substrate temperature (<sup>°</sup>C)</td><td align="center">130</td></tr><tr><td align="left">Film growth rate (nm/s)</td><td align="center">0.05</td></tr><tr><td align="left">Oxygen flow rate (sccm)</td><td align="center">0, 1, 3, 5, 7, 12</td></tr><tr><td align="left">Film thickness (nm)</td><td align="center">140</td></tr><tr class="table-tr"><td colspan="2"><hr class="tbody-hr"/></td></tr></table></td></tr></table>

The conditions and oxygen flow settings for the MZO deposition.

Journal of Nanomaterials

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Table 2

Table 2: Effects of Additional Oxygen Flow on the Optical and Electrical Properties of Ion Beam Sputtering Deposited Molybdenum-Doped Zinc Oxide Layer 

Table 2 | Effects of Additional Oxygen Flow on the Optical and Electrical Properties of Ion Beam Sputtering Deposited Molybdenum-Doped Zinc Oxide Layer 