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Journal of Nanomaterials
Volume 2012 (2012), Article ID 938495, 5 pages
Research Article

Simple Method for Surface Selective Adsorption of Semiconductor Nanocrystals with Nanometric Resolution

1Applied Physics Department and Center for Nanoscience and Nanotechnology, Hebrew University of Jerusalem, 91904 Jerusalem, Israel
2Racah Institute of Physics, Hebrew University of Jerusalem, 91904 Jerusalem, Israel

Received 14 October 2012; Accepted 26 November 2012

Academic Editor: Chuanfei Guo

Copyright © 2012 O. Koslovsky et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.


Self-assembly methods play a major role in many modern fabrication techniques for various nanotechnology applications. In this paper we demonstrate two alternatives for self-assembled patterning within the nanoscale resolution of optically active semiconductor nanocrystals. The first is substrate selective and uses any high resolution surface patterning to achieve localized self-assembly. The second method uses a surface with poly(methyl methacrylate) (PMMA) resist patterning adsorption of the nanocrystal with covalent bonds and liftoff.