Research Article

Influence of Annealing on Properties of Spray Deposited ZnO Thin Films

Figure 2

FESEM images of ZnO thin film deposited on Si substrate (a) unannealed, (b) annealed at 300°C, (c) annealed at 400°C, and (d) annealed at 500°C.
146382.fig.002a
(a)
146382.fig.002b
(b)
146382.fig.002c
(c)
146382.fig.002d
(d)