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Journal of Nanomaterials
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Journal of Nanomaterials
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2013
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Article
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Tab 2
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Research Article
Nucleation and Growth Mechanism of Si Amorphous Film Deposited by PIAD
Table 2
The surface roughness of the substrate and deposited Si films with different thickness.
PV (nm)
RMS (nm)
Substrate
10.1
0.8
2 nm Si film
17.3
1.0
5 nm Si film
58.1
3.0
10 nm Si film
10.2
0.8