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Journal of Nanomaterials
Volume 2013, Article ID 542737, 9 pages
Research Article

Fabrication of Silicon Nitride Ion Sensitive Field-Effect Transistor for pH Measurement and DNA Immobilization/Hybridization

Institute of Nano Electronic Engineering (INEE), Universiti Malaysia Perlis (UniMAP), 01000 Kangar Perlis, Malaysia

Received 10 July 2013; Accepted 10 September 2013

Academic Editor: Hongchen Chen Gu

Copyright © 2013 U. Hashim et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

Citations to this Article [5 citations]

The following is the list of published articles that have cited the current article.

  • Md. Abdul Barik, and Jiten Ch. Dutta, “Fabrication and characterization of junctionless carbon nanotube field effect transistor for cholesterol detection,” Applied Physics Letters, vol. 105, no. 5, pp. 053509, 2014. View at Publisher · View at Google Scholar
  • Siphephile Ncube, George Chimowa, Zivayi Chiguvare, and Somnath Bhattacharyya, “Realizing one-dimensional quantum and high-frequency transport features in aligned single-walled carbon nanotube ropes,” Journal of Applied Physics, vol. 116, no. 2, pp. 024306, 2014. View at Publisher · View at Google Scholar
  • Nang Mo Hom, Chamras Promptmas, and Kesara Wat-Aksorn, “Detection of DNA Hybridization Using Protein A Modified Ion Sensitive Field Effect Transistor,” Analytical Letters, pp. 141231105147003, 2014. View at Publisher · View at Google Scholar
  • Sihyun Kim, Dae Woong Kwon, Ryoongbin Lee, Dae Hwan Kim, and Byung-Gook Park, “Investigation of drift effect on silicon nanowire field effect transistor based pH sensor,” Japanese Journal Of Applied Physics, vol. 55, no. 6, 2016. View at Publisher · View at Google Scholar
  • Nurhidaya Soriadi, Azlina Mohd Zain, Sharaifah Kamariah Wan Sabli, Mohd Rofei Mat Hussin, and Hing Wah Lee, “Study of Oxide Hardmask Effect on High Dose Implant Process for ISFET Fabrication,” Procedia Engineering, vol. 184, pp. 643–647, 2017. View at Publisher · View at Google Scholar