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Journal of Nanomaterials
Volume 2013, Article ID 851489, 6 pages
Review Article

Characterisation of C–F Polymer Film Formation on the Air-Bearing Surface Etched Sidewall of Fluorine-Based Plasma Interacting with AL2O3–TiC Substrate

1Department of Physics, Faculty of Science, King Mongkut's University of Technology Thonburi, Bangkok 10140, Thailand
2Division of Material Science, Faculty of Science, Maejo University, Chiang Mai 50290, Thailand
3Western Digital (Thailand) Company Limited, Ayutthaya 13160, Thailand

Received 25 February 2013; Accepted 28 May 2013

Academic Editor: Shafiul Chowdhury

Copyright © 2013 Alonggot Limcharoen et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.


C–F polymer redeposition is generated on the etched sidewall of the patterned air-bearing surface (ABS). This C–F polymer is a by-product from fluorine-based plasma using a Surface Technology Systems multiplex-pro air-bearing etch (ABE). The morphology of the re-deposition and the composite element was observed by a scanning electron microscope (SEM). The chemical bonding results were characterised via X-ray photoelectron spectroscopy, attenuated total reflected infrared spectroscopy and visible Raman spectroscopy. The purpose of this work is to demonstrate a modification of AlF3 re-deposition to C–F polymer re-deposition, which is easily stripped out by an isopropyl alcohol-based solution. The benefit of this research is the removal of the re-deposition in the resist strip process without additional cleaning process steps.