Characterisation of C–F Polymer Film Formation on the Air-Bearing Surface Etched Sidewall of Fluorine-Based Plasma Interacting with AL<sub>2</sub>O<sub>3</sub>–TiC Substrate

<table>Schematic of multiplex-pro air-bearing etch ICP process chamber [<a href="/journals/jnm/2013/851489/#B10">10</a>].</table>

Journal of Nanomaterials

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Figure 1

Figure 1: Characterisation of C–F Polymer Film Formation on the Air-Bearing Surface Etched Sidewall of Fluorine-Based Plasma Interacting with AL<sub>2</sub>O<sub>3</sub>–TiC Substrate 

Figure 1 | Characterisation of C–F Polymer Film Formation on the Air-Bearing Surface Etched Sidewall of Fluorine-Based Plasma Interacting with AL2O3–TiC Substrate 