Microstructure Changes of Ti-Al-C Films Deposited by Filtered Cathodic Vacuum Arc

Table 1

Summary of the films deposition conditions.

Item	Parameter
CH4 gas flow rate (sccm)	30, 40, 50, 60, 70, 80
Ar gas flow rate (sccm)	120
Deposition pressure (Pa)	0.54~0.70
Thickness (μm)	1.5
Arc current (A)	80