Research Article

Temperature Effects on a-IGZO Thin Film Transistors Using HfO2 Gate Dielectric Material

Figure 1

(a) Schematic cross-section of the fabricated bottom-gate a-IGZO TFTs with gate dielectric. (b) Top view of the a-IGZO TFTs with gate dielectric. The device had dimensions of μm.
347858.fig.001a
(a)
347858.fig.001b
(b)