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Journal of Nanomaterials
Volume 2014, Article ID 351360, 6 pages
http://dx.doi.org/10.1155/2014/351360
Research Article

Facile Deposition of Ultrafine Silver Particles on Silicon Surface Not Submerged in Precursor Solutions for Applications in Antireflective Layer

1State Key Laboratory of Alternate Electrical Power System with Renewable Energy Sources, School of Renewable Energy, North China Electric Power University, Beijing 102206, China
2Suzhou Institute, North China Electric Power University, Suzhou 215123, China

Received 22 January 2014; Revised 20 March 2014; Accepted 21 March 2014; Published 15 April 2014

Academic Editor: Yanbao Zhao

Copyright © 2014 Bing Jiang et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

Abstract

Using a facile deposition method, the ultrafine silver particles are successfully deposited on the Si surface that is not submerged in precursor solutions. The ultrafine silver particles have many advantages, such as quasiround shape, uniformity in size, monodisperse distribution, and reduction of agglomeration. The internal physical procedure in the deposition is also investigated. The results show that there are more particles on the rough Si surface due to the wetting effect of solid-liquid interface. The higher concentration of ethanol solvent can induce the increase of quantity and size of particles on Si surface not in solutions. The ultrafine particles can be used to prepare porous Si antireflective layer in solar cell applications.