Research Article
Growth and Characterization of Nanostructured TiCrN Films Prepared by DC Magnetron Cosputtering
Table 1
Deposition conditions for TiCrN films.
| | Parameters | Details |
| | Base pressure (mbar) | 5 × 10−5 | | Working pressure (mbar) | 4 × 10−5 | | Ar flow rate (sccm) | 3.0 | | N2 flow rate (sccm) | 6.0 | | Cr sputtering current, (A) | 0.6 | | Ti sputtering current, (A) | 0.4, 0.6, 0.8, and 1.0 | | Deposition time (min) | 60 |
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