Research Article
Growth and Characterization of Nanostructured TiCrN Films Prepared by DC Magnetron Cosputtering
Table 2
Elemental composition, Ti content (
value), N content (
value), and film composition as a function of the Ti sputtering current.
| | (A) | Elemental composition (at. %) | = Ti/(Ti + Cr) | = N/(Ti + Cr) |
Film composition
() | | Ti | Cr | N | O |
| | 0.4 | 4.72 | 42.98 | 34.78 | 17.52 | 0.10 | 0.73 | Ti0.10Cr0.90N0.73 | | 0.6 | 10.04 | 35.74 | 37.30 | 16.92 | 0.22 | 0.81 | Ti0.22Cr0.78N0.81 | | 0.8 | 16.29 | 30.55 | 38.29 | 14.87 | 0.35 | 0.82 | Ti0.33Cr0.65N0.82 | | 1.0 | 17.60 | 29.58 | 39.07 | 13.75 | 0.37 | 0.83 | Ti0.37Cr0.63N0.83 |
|
|
