Growth and Characterization of Nanostructured TiCrN Films Prepared by DC Magnetron Cosputtering

Table 4

The percentage of bond fraction contributing to Ti 2p_3/2, Ti 2p_1/2, Cr 2p_3/2, Cr 2p_1/2, and N 1s.

𝐼Ti (A)	Ti 2p3/2 + Ti 2p1/2		Cr 2p3/2 + Cr 2p1/2		N 1s
	Bond assigned	Bond fraction (%)	Bond assigned	Bond fraction (%)	Bond assigned	Bond fraction (%)
0.4	Ti–N	38.11	Cr–Cr	23.66	N-metals	75.84
	Ti–O	61.89	Cr–N	30.74	N–O	24.16
			Cr–O	45.60
0.6	Ti–N	44.00	Cr–Cr	20.68	N-metals	75.11
	Ti–O	56.00	Cr–N	26.78	N–O	24.89
			Cr–O	52.54
0.8	Ti–N	44.18	Cr–Cr	17.13	N-metals	74.32
	Ti–O	55.82	Cr–N	29.79	N–O	25.68
			Cr–O	53.08
1.0	Ti–N	49.08	Cr–Cr	19.23	N-metals	75.73
	Ti–O	50.92	Cr–N	29.55	N–O	24.27
			Cr–O	51.22