Regression Analysis of the Effect of Bias Voltage on Nano- and Macrotribological Properties of Diamond-Like Carbon Films Deposited by a Filtered Cathodic Vacuum Arc Ion-Plating Method

Table 1

Deposition condition.

Bias	Direct current	−50 to −200 V
	Pulse bias	−0.5 to −2.0 kV
	Ground, floating
	Film thickness: ~200 nm