Journals
Publish with us
Publishing partnerships
About us
Blog
Journal of Nanomaterials
Journal overview
For authors
For reviewers
For editors
Table of Contents
Special Issues
Journal of Nanomaterials
/
2014
/
Article
/
Fig 1
/
Research Article
Resistive Switching Characteristics of a SiO
x
Layer with CF
4
Plasma Treatment
Figure 1
(a) The XPS results of the control and CF
4
-treated films and (b) the measurement configuration of the conducting filament formation.
(a)
(b)