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Journal of Nanomaterials
Volume 2014, Article ID 857614, 7 pages
http://dx.doi.org/10.1155/2014/857614
Research Article

Effects of Hydrogen on the Optical and Electrical Characteristics of the Sputter-Deposited Al2O3-Doped ZnO Thin Films

1Department of Electrical Engineering and Graduate Institute of Optoelectronic Engineering, National Chung Hsing University, Taichung 402, Taiwan
2Department of Chemical and Materials Engineering, National University of Kaohsiung, Kaohsiung 811, Taiwan
3Electronics and Optoelectronics Research Laboratories, Industrial Technology Research Institute, Hsinchu 310, Taiwan

Received 22 October 2013; Accepted 13 January 2014; Published 9 March 2014

Academic Editor: Hong Seok Lee

Copyright © 2014 Fang-Hsing Wang et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

Citations to this Article [11 citations]

The following is the list of published articles that have cited the current article.

  • Fang-Hsing Wang, Shang-Chao Hung, Cheng-Fu Yang, and Yen-Hsien Lee, “Effects of Hydrogen Plasma on the Electrical Properties of F-Doped ZnO Thin Films and p-i-n -Si:H Thin Film Solar Cells,” International Journal of Photoenergy, vol. 2014, pp. 1–7, 2014. View at Publisher · View at Google Scholar
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  • Kun-Neng Chen, Chao-Ming Hsu, Jing Liu, Yu-Chen Liou, and Cheng-Fu Yang, “Investigation of Antireflection Nb2O5 Thin Films by the Sputtering Method under Different Deposition Parameters,” Micromachines, vol. 7, no. 9, pp. 151, 2016. View at Publisher · View at Google Scholar
  • P Saikia, H Bhuyan, D E Diaz-Droguett, F Guzman, S Mändl, B K Saikia, M Favre, J R Maze, and E Wyndham, “Effect of hydrogen addition on the deposition of titanium nitride thin films in nitrogen added argon magnetron plasma,” Journal of Physics D: Applied Physics, vol. 49, no. 22, pp. 225203, 2016. View at Publisher · View at Google Scholar
  • Kaushik Balakrishnan, Farid Touati, Masud Mansuripur, Charles M. Falco, Zhaozhao Zhu, Trent Mankowski, Ali Sehpar Shikoh, and Mohieddine A. Benammar, “Sol-gel deposited aluminum-doped and gallium-doped zinc oxide thin-film transparent conductive electrodes with a protective coating of reduced graphene oxide,” Journal of Nanophotonics, vol. 10, no. 2, 2016. View at Publisher · View at Google Scholar
  • Libu Manjakkal, I. Packia Selvam, S.N. Potty, and R.S. Shinde, “Electrical and optical properties of aluminium doped zinc oxide transparent conducting oxide films prepared by dip coating technique,” Microelectronics International, vol. 34, no. 1, pp. 1–8, 2017. View at Publisher · View at Google Scholar
  • Jorge A. García-Valenzuela, Jordi Andreu, and Joan Bertomeu, “Effect of the base pressure achieved prior deposition on the main properties of ZnO:Al films obtained by DC magnetron sputtering at room temperature for electrical contact use,” Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, vol. 35, no. 2, pp. 021603, 2017. View at Publisher · View at Google Scholar
  • Song-You Wang, Liang-Yao Chen, Er-Tao Hu, Ke-Han Yu, Wei Wei, Yu-Xiang Zheng, Tong Gu, Shuai Guo, Ying Wu, Jing Wang, and Zhong-Yue Wang, “Ellipsometric study on optical properties of hydrogen plasma-treated aluminum-doped ZnO thin film,” Vacuum, vol. 163, pp. 69–74, 2019. View at Publisher · View at Google Scholar
  • Ali Salimian, Roohollah Haghpanahan, Abul Hasnath, and Hari Upadhyaya, “Optical Analysis of RF Sputtering Plasma through Colour Characterization,” Coatings, vol. 9, no. 5, pp. 315, 2019. View at Publisher · View at Google Scholar
  • Zulkifli, Lau, Yusop, Ibrahim, and Arsad, “Influence of hydrogen flow rates annealing on the structural, optical and electrical properties of sol-gel synthesized fe doped In2O3Films,” Sains Malaysiana, vol. 48, no. 1, pp. 209–216, 2019. View at Publisher · View at Google Scholar