From Plastic to Silicone: The Novelties in Porous Polymer Fabrications

Table 1

Typical materials and etching techniques for preparation of nanoporous materials from block copolymers. Reprinted from [14], with permission from John Wiley & Sons.

Polymers	Sacrificial block	Etching conditions
PS-PMMA	PMMA	Deep UV exposure followed by acetic acid rinsing
PS-PI; PVP-PI; PS-PBD	PI; PI; PBD	Ozonolysis
PS-PLA; PCHE-PLA	PLA	0.5 M NaOH in 40 : 60 (v/v) methanol/water mixture (65°C, 5–10 days)
PS-PLLA; PS-PEO	PLLA; PEO	57 wt% (65°C, 5 days)
PI-PDMS; PB-PDMS	PDMS	1.0 M TBAF in THF (RF, 36–48 h)
PS-PDMS; PBA-PCEMA	a	Anhydrous HF (0°C, 2 h); 0.05 M TMSI in (RT, 2–14 days) followed by 5 : 95 (v/v) water/methanol (RT, 2 days)
PE-PS	PS	Fuming nitric acid (RT, 30 min)
P(imide)-PPG	PPG	Heat to 240°C under vacuum