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Journal of Nanomaterials
Volume 2015, Article ID 167569, 7 pages
http://dx.doi.org/10.1155/2015/167569
Research Article

Impact of NiOx Buffer Layers on the Dielectric Properties of BaTiO3 Thin Films on Nickel Substrates Fabricated by Polymer Assisted Deposition

1State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu, Sichuan 610054, China
2Institute of Electronic and Information Engineering in Dongguan, University of Electronic Science and Technology of China, Dongguan, Guangdong 523808, China

Received 26 January 2015; Revised 23 May 2015; Accepted 28 May 2015

Academic Editor: Joydeep Dutta

Copyright © 2015 Hui Du et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

Hui Du, Yang Li, Wei Zheng Liang, et al., “Impact of NiOx Buffer Layers on the Dielectric Properties of BaTiO3 Thin Films on Nickel Substrates Fabricated by Polymer Assisted Deposition,” Journal of Nanomaterials, vol. 2015, Article ID 167569, 7 pages, 2015. https://doi.org/10.1155/2015/167569.