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Journal of Nanomaterials
Volume 2015, Article ID 194308, 9 pages
Research Article

Substrate Temperature Effect on the Microstructure and Properties of (Si, Al)/a-C:H Films Prepared through Magnetron Sputtering Deposition

1Material Corrosion and Protection Key Laboratory of Sichuan Province, Sichuan University of Science and Engineering, Zigong 643000, China
2State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000, China

Received 11 May 2015; Revised 3 August 2015; Accepted 4 August 2015

Academic Editor: Dan Xia

Copyright © 2015 Xiaoqiang Liu et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.


Hydrogenated amorphous carbon films codoped with Si and Al ((Si, Al)/a-C:H) were deposited through radio frequency (RF, 13.56 MHz) magnetron sputtering on Si (100) substrate at different temperatures. The composition and structure of the films were investigated by means of X-ray photoelectron spectroscopy (XPS), TEM, and Raman spectra, respectively. The substrate temperature effect on microstructure and mechanical and tribological properties of the films was studied. A structural transition of the films from nanoparticle containing to fullerene-like was observed. Correspondingly, the mechanical properties of the films also had obvious transition. The tribological results in ambient air showed that high substrate temperature (>573 K) was disadvantage of wear resistance of the films albeit in favor of formation of ordering carbon clusters. Particularly, the film deposited at temperature of 423 K had an ultralow friction coefficient of about 0.01 and high wear resistance.