Fabrication of an Antireflective Nanodome Array with High Packing Density for Photovoltaic Applications

Figure 3

SEM images of the fabricated nanodome master with deposited SiO₂ thicknesses of (a) 50, (b) 100, (c) 150, and (d) 200 nm; EHT of 5 kV was used for (a) and (b) and 16.29 kV was used for (c) and (d).

(a)

(b)

(c)

(d)