Surface Patterning of PEDOT:PSS by Photolithography for Organic Electronic Devices

Figure 1

Lift-off processes of photolithographic patterning of PEDOT:PSS. Photoresist was first spin-coated (a) and patterned (b), (c) on a substrate. Then, PEDOT:PSS was subsequently deposited (d). After lift-off of left resist, PEDOT:PSS patterns are left on the substrate (e).