Solution-Grown Zn/Al Layered Double Hydroxide Nanoplatelets onto Al Thin Films: Fine Control of Position and Lateral Thickness

Figure 3

The electrical resistance of the aluminum microresistor as a function of the immersion time during the wet-chemical growth of LDH (purple dots). The continuous black line is a fit with a hyperbolic function of time according to (2). The blue line represents the aluminum thickness reduction.