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Journal of Nanomaterials
Volume 2015, Article ID 810986, 6 pages
Research Article

Dynamic Deposition of Nanocopper Film on the β-SiCp Surface by Magnetron Sputtering

College of Materials Science & Engineering, Jiamusi University, Jiamusi 154007, China

Received 2 February 2015; Revised 4 May 2015; Accepted 4 May 2015

Academic Editor: Donglu Shi

Copyright © 2015 Hu Ming et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.


The uniform nanocopper film was deposited on the surface of micron β-SiC particle by magnetron sputtering technology successfully. The surface morphology and phase constitution of the β-SiC particle with nanocopper film were analyzed and dynamic deposition behavior was investigated in detail. The concept of dynamic deposition was put forward to interpret formation mechanism of copper nanofilm on the surface of β-SiC particles.