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Journal of Nanomaterials
Volume 2016, Article ID 3623547, 12 pages
http://dx.doi.org/10.1155/2016/3623547
Research Article

Electrodeposition-Based Fabrication and Characteristics of Tungsten Trioxide Thin Film

1Department of Industrial Education, National Taiwan Normal University, No. 162, Section 1, He-ping E. Road, Da-an District, Taipei City 10610, Taiwan
2Department of Mechatronic Engineering, National Taiwan Normal University, No. 162, Section 1, He-ping E. Road, Da-an District, Taipei City 10610, Taiwan

Received 28 November 2015; Revised 18 February 2016; Accepted 29 March 2016

Academic Editor: Zainovia Lockman

Copyright © 2016 Li Lin et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

Abstract

In this study, tungsten trioxide (WO3) thin films were electrodeposited on indium tin oxide (ITO) glass to form WO3-coated glass. The electrodeposition (ED) time () and ED current () were varied to control the film thickness and morphology. Furthermore, the crystallization of the thin films was controlled by annealing them at 250°C, 500°C, and 700°C. The results showed that the thickness of the WO3 thin films increased with and . The as-deposited thin films and those annealed at 250°C were amorphous, whereas the WO3 thin films annealed at 500 and 700°C were in the anorthic phase. Moreover, the amorphous WO3-coated glass exhibited high transmittance in visible light and low transmittance in near-infrared light, whereas the anorthic WO3-coated glass had high transmittance in near-infrared light. An empirical formula for determining the thickness of WO3 thin films was derived through multiple regressions of the ED process parameters.