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Journal of Nanomaterials
Volume 2017, Article ID 5750907, 1 page
https://doi.org/10.1155/2017/5750907
Editorial

Advanced Nanostructured Semiconductor Materials: Morphology Controlled Synthesis and Application

1Intel Corporation, Santa Clara, CA, USA
2Pacific Northwest National Laboratory, Richland, WA, USA
3University of Wollongong, Wollongong, NSW, Australia

Correspondence should be addressed to Gengxin Zhang; moc.letni@gnahz.nixgneg

Received 26 February 2017; Accepted 27 February 2017; Published 8 March 2017

Copyright © 2017 Gengxin Zhang et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

Gengxin Zhang, Xin Zhang, Javad Foroughi, Jimin Yao, and Jia Liu, “Advanced Nanostructured Semiconductor Materials: Morphology Controlled Synthesis and Application,” Journal of Nanomaterials, vol. 2017, Article ID 5750907, 1 pages, 2017. https://doi.org/10.1155/2017/5750907.