Incorporation of Ge on High <i>K</i> Dielectric Material for Different Fabrication Technologies (HBT, CMOS) and Their Impact on Electrical Characteristics of the Device

<div>Ge XPS spectra for sample SN1 [<a href="/journals/jnm/2018/2497352/#B5">5</a>].</div>

Journal of Nanomaterials

fig6

Figure 6

Figure 6: Incorporation of Ge on High <i>K</i> Dielectric Material for Different Fabrication Technologies (HBT, CMOS) and Their Impact on Electrical Characteristics of the Device 

Figure 6 | Incorporation of Ge on High K Dielectric Material for Different Fabrication Technologies (HBT, CMOS) and Their Impact on Electrical Characteristics of the Device 