Journal of Nanomaterials / 2019 / Article / Tab 1

Research Article

Comprehensive Study of Kinetics of Processes Competing during PECVD Ultrathin Silicon Layer High-Temperature Annealing

Table 1

Thickness and phase composition of as-deposited “thin” and “thick” PECVD layers.

“Thin” layer“Thick” layer
Composition (%)Phase thickness (Å)Composition (%)Phase thickness (Å)

a-Si49266857
c-Si30161513
SiO221111714
Total for PECVD silicon layer1005310084

Article of the Year Award: Outstanding research contributions of 2020, as selected by our Chief Editors. Read the winning articles.