Journal of Nanomaterials / 2019 / Article / Tab 1

Research Article

Comprehensive Study of Kinetics of Processes Competing during PECVD Ultrathin Silicon Layer High-Temperature Annealing

Table 1

Thickness and phase composition of as-deposited “thin” and “thick” PECVD layers.

“Thin” layer“Thick” layer
Composition (%)Phase thickness (Å)Composition (%)Phase thickness (Å)

Total for PECVD silicon layer1005310084

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