Research Article
Generation Control of ZnO Nanoparticles Using a Coaxial Gas-Flow Pulse Plasma Ar/O2 Plasma
Figure 2
SEM images of particles deposited on Si substrate with deposition time as a parameter. Applied voltage is −650 V and flow rate ratio of Ar/O2 is 25 sccm/25 sccm.
(a) |
(b) |
(c) |