Importance of Molds for Nanoimprint Lithography: Hard, Soft, and Hybrid Molds

Figure 9

SEM and optical microscopic images of replication results. (a) Master pattern of 75 nm line space polarizer. (b) Replicated pattern of (a). (c) Replicated pattern of a 100 nm line space circuit pattern. Inset is the cross-sectional SEM images. Bar scale in the inset is 500 nm. (d) Example of large-area replication of hologram gratings. Reproduced from permission from [3]. Copyright 2004 American Chemical Society.