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Research Letters in Nanotechnology
Volume 2008, Article ID 765398, 4 pages
http://dx.doi.org/10.1155/2008/765398
Research Letter

Achieving High Aspect Ratio of Track Length to Width in Molds for Discrete Track Recording Media

1Data Storage Institute, A STAR (Agency for Science, Technology and Research), 5 Engineering Drive 1, Singapore 117608
2Department of Electrical and Computer Engineering, National University of Singapore 4 Engineering Drive 3, Singapore 117576

Received 29 November 2007; Accepted 5 February 2008

Academic Editor: Sakhrat Khizroev

Copyright © 2008 K. O. Aung et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

Citations to this Article [2 citations]

The following is the list of published articles that have cited the current article.

  • R. Sbiaa, E. L. Tan, R. M. Seoh, K. O. Aung, S. K. Wong, and S. N. Piramanayagam, “Sub-50-nm track pitch mold using electron beam lithography for discrete track recording media,” Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 26, no. 5, pp. 1666, 2008. View at Publisher · View at Google Scholar
  • Jianjun Li, Weiwei Zhang, Yujun Song, Weiting Yin, and Tao Zhang, “Template Transfer Nanoimprint for Uniform Nanopores and Nanopoles,” Journal of Nanomaterials, vol. 2016, pp. 1–7, 2016. View at Publisher · View at Google Scholar