Journal of Nanotechnology / 2011 / Article / Fig 2

Research Article

Process-Parameter-Dependent Structural, Electrical, and Optical Properties of Reactive Magnetron Sputtered Ag-Cu-O Films

Figure 2

X-ray diffraction profiles of Ag-Cu-O films formed at different oxygen partial pressures: (a) 5 × 10−3 Pa, (b) 2 × 10−2 Pa, and (c) 5 × 10−2 Pa.
986021.fig.002