Process-Parameter-Dependent Structural, Electrical, and Optical Properties of Reactive Magnetron Sputtered Ag-Cu-O Films

X-ray diffraction profiles of Ag-Cu-O films formed at different oxygen partial pressures: (a) 5 × 10⁻³ Pa, (b) 2 × 10⁻² Pa, and (c) 5 × 10⁻² Pa.