Research Article
Large-Scale Atmospheric Step-and-Repeat UV Nanoimprinting
Table 2
Imprinting conditions.
| Spin-coated resin thickness after baking | 120 nm | Photo-curable resin viscosity | 12,000 mPa·s | Imprinting pressure | 2 MPa | Imprinting platen feed velocity | 1 μm/s | Imprinting total UV light exposure 1-cycle UV light exposure time | 360 mJ/cm2 12 s | RIE process gasses | C4F8, SF6 | RIE RF power | 500 W | RIE process time | 180 s |
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