SU-8 as Hydrophobic and Dielectric Thin Film in Electrowetting-on-Dielectric Based Microfluidics Device

<table class="table-group" width="800px"><tr class="fig-image" id="a"><td><img alt="312784.fig.004a" src="https://static.hindawi.com/articles/jnt/volume-2012/312784/figures/312784.fig.004a.jpg"/></td></tr><tr class="fig-caption"><td align="center"><table><tr><td><b>(a) </b>SiO<sub>2</sub></td></tr></table></td></tr><tr class="fig-image" id="b"><td><img alt="312784.fig.004b" src="https://static.hindawi.com/articles/jnt/volume-2012/312784/figures/312784.fig.004b.jpg"/></td></tr><tr class="fig-caption"><td align="center"><table><tr><td><b>(b) </b>Cr/Au etching</td></tr></table></td></tr><tr class="fig-image" id="c"><td><img alt="312784.fig.004c" src="https://static.hindawi.com/articles/jnt/volume-2012/312784/figures/312784.fig.004c.jpg"/></td></tr><tr class="fig-caption"><td align="center"><table><tr><td><b>(c) </b>Spin-coated SU-8 as dielectric</td></tr></table></td></tr></table>

<table>Process flow of EWOD device.</table>

Journal of Nanotechnology

fig4

Figure 4

Figure 4: SU-8 as Hydrophobic and Dielectric Thin Film in Electrowetting-on-Dielectric Based Microfluidics Device 