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Journal of Nanotechnology
Volume 2012 (2012), Article ID 325732, 13 pages
http://dx.doi.org/10.1155/2012/325732
Research Article

Procedures and Properties for a Direct Nano-Micro Integration of Metal and Semiconductor Nanowires on Si Chips

1Functional Nanomaterials, Institute for Materials Science, Christian-Albrechts-University Kiel, Kaiserstraβe 2, 24143 Kiel, Germany
2Multicomponent Materials, Institute for Materials Science, Christian-Albrechts-University Kiel, Kaiserstraβe 2, 24143 Kiel, Germany

Received 18 September 2011; Revised 13 October 2011; Accepted 16 October 2011

Academic Editor: Qihua Xiong

Copyright © 2012 Dawit Gedamu et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

Dawit Gedamu, Ingo Paulowicz, Seid Jebril, Yogendra Kumar Mishra, and Rainer Adelung, “Procedures and Properties for a Direct Nano-Micro Integration of Metal and Semiconductor Nanowires on Si Chips,” Journal of Nanotechnology, vol. 2012, Article ID 325732, 13 pages, 2012. doi:10.1155/2012/325732