Procedures and Properties for a Direct Nano-Micro Integration of Metal and Semiconductor Nanowires on Si Chips

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<tspan style="font-size: 12.50px; " x="0" y="0">𝐼</tspan>
<tspan style="font-size: 12.50px; " x="7.1142068" y="0">-</tspan>
<tspan style="font-size: 12.50px; " x="11.277706" y="0">𝑉</tspan>
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</svg> characteristics (a) before anodization and (b) after anodization. The resistance increases from 0.076 MΩ to 217 MΩ.</table>

Journal of Nanotechnology

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Figure 7

Figure 7: Procedures and Properties for a Direct Nano-Micro Integration of Metal and Semiconductor Nanowires on Si Chips 