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Journal of Nanotechnology
Volume 2013 (2013), Article ID 736478, 9 pages
Improving Passivation Process of Si Nanocrystals Embedded in SiO2 Using Metal Ion Implantation
Instituto de Física, Universidad Nacional Autónoma de México, 04510 México, DF, Mexico
Received 30 October 2012; Accepted 16 December 2012
Academic Editor: A. M. Rao
Copyright © 2013 Jhovani Bornacelli et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
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