Review Article

Direct-Write Ion Beam Lithography

Figure 5

Tilted view (a-b) and plane view (c) SEM micrographs of 40 nm thick segmented gold islands made by overlaid milling of crossing lines. Localized surface plasmons interact through the approximately 20 nm wide gaps that were intentionally overmilled deeper into the silicon, as this feature was predicted to favorably affect electromagnetic field enhancement between the gold segments in the near infrared spectral range [114].
170415.fig.005a
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170415.fig.005b
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170415.fig.005c
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