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Journal of Nanotechnology
Volume 2016, Article ID 1963847, 6 pages
Research Article

Characteristics of Silicon Dioxide Particles in PCVD Synthesizing Silica Glass Process

China Building Materials Academy, Beijing 100024, China

Received 8 November 2015; Revised 26 January 2016; Accepted 27 January 2016

Academic Editor: Enkeleda Dervishi

Copyright © 2016 Yuancheng Sun et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.


SiO2 nanoparticles in PCVD process were investigated by SEM, TEM, and optical emission spectra (OES). There are large spherical SiO2 particles with diameter of 50–200 nm and more small particles about 10–50 nm in PCVD process. Size of SiO2 particles is influenced by distance and feeding speed but not electron temperature. The amount of large spherical SiO2 particles decreases with the increase of distance and decrease of feeding speed due to lower concentration. In addition, the evolution of SiO2 particles was inferred from the experimental results.