Deposition and Characterization of Molybdenum Thin Film Using Direct Current Magnetron and Atomic Force Microscopy

<table class="table-group" id="tab1"><tr><td><table class="table"><tr><td class="thead-hr" colspan="2"><hr/></td></tr><tr class="thead"><td class="align_left">Input parameter</td><td class="align_center">Range</td></tr><tr><td class="thead-hr" colspan="2"><hr/></td></tr><tr><td class="align_left">DC power</td><td class="align_center">200 Watt</td></tr><tr><td class="align_left">Working pressure</td><td class="align_center">10 mTorr</td></tr><tr><td class="align_left">Argon flow</td><td class="align_center">20 sccm</td></tr><tr><td class="align_left">Deposition time</td><td class="align_center">5–85 minutes</td></tr><tr class="table-tr"><td colspan="2"><hr class="tbody-hr"/></td></tr></table></td></tr></table>

Journal of Nanotechnology

tab1

Table 1

Table 1: Deposition and Characterization of Molybdenum Thin Film Using Direct Current Magnetron and Atomic Force Microscopy 