Research Article

PMMA-Assisted Plasma Patterning of Graphene

Table 2

Process to transfer the PMMA/graphene from a copper foil to an oxide wafer. Transfer of the PMMA/graphene membrane between recipients is made with a silicon wafer.

StepDescription

1Etch copper (backside of PMMA/graphene/copper) by floating on a diluted copper etchant/H2O (1 : 10) solution for 12 hours

2Rinse the PMMA/graphene by floating on distilled water for 2 minutes. Repeat five times the procedure

3Rinse the PMMA/graphene by floating on a diluted HCl/H2O (1 : 20) solution for 15 minutes [40]

4Rinse the PMMA/graphene by floating on distilled water for 2 minutes. Repeat three times the procedure

5Pick up the PMMA/graphene with an oxide (SiO2/Si) wafer

6Dry the PMMA/graphene/wafer either at 37°C for 3 hours on a hot plate or at room temperature (21°C) in a vented hood for 12 hours