Journal of Nanotechnology / 2019 / Article / Tab 1

Research Article

Growth of MWCNTs on Plasma Ion-Bombarded Thin Gold Films and Their Enhancements of Ammonia-Sensing Properties Using Inkjet Printing

Table 1

Sputtered conditions for deposition of Al2O3 and Au films.

ParametersAl2O3 filmAu film

Base pressure (mbar)5 × 10−55 × 10−3
Working pressure (mbar)3 × 10−31 × 10−1
Substrate temperature (°C)R.TR.T
Distance between the target and the substrate (cm)105
Ar flow rate (sccm)55
O2 flow rate (sccm)1
DC power (W)21620
Sputtering time (s)6030

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