Research Article
Stability Improvement of an Efficient Graphene Nanoribbon Field-Effect Transistor-Based SRAM Design
Table 1
Device parameters of graphene nanoribbon field-effect transistor.
| Device parameters | Values |
| Length of the channel | 15 nm | Top gate dielectric material thickness | 0.95 nm | Space between adjacent GNRs | 2 nm | No. of GNRs | 6 | Substrate oxide thickness | 20 nm | No. of dimer lines in GNR lattice | 12 |
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