Journal of Sensors / 2010 / Article / Fig 2

Research Article

Experiments on the Release of CMOS-Micromachined Metal Layers

Figure 2

Microphotograph of a CMOS-MEMS membrane released with hydrofluoric acid (HF). Etching time was 6 min and 30 sec and HF concentration was 2.5%. The arms and part of the membrane disappeared, but only few nanometers of silicon dioxide were removed.

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