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Journal of Sensors
Volume 2014, Article ID 926314, 8 pages
http://dx.doi.org/10.1155/2014/926314
Research Article

Long-Stroke Nanopositioning Stage Driven by Piezoelectric Motor

1School of Mechatronic Engineering and Automation, Shanghai University, Shanghai 200072, China
2Research Center of Robotics and Microsystem and Collaborative Innovation Center of Suzhou Nano Science and Technology, Soochow University, Suzhou 215021, China
3College of Automation, Harbin Engineering University, Harbin 150001, China

Received 15 July 2014; Revised 14 October 2014; Accepted 5 November 2014; Published 24 November 2014

Academic Editor: Stefania Campopiano

Copyright © 2014 Yong Wang et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

Abstract

This paper reported a biaxial nanopositioning stage single-driven by piezoelectric motor. The employed piezoelectric motor can perform two different driving modes, namely, AC drive mode to drive in long-stroke and at high-speed and DC scanning mode with the high-resolution of several nanometers, which satisfies the requirements of both long-stroke and nanoresolution. To compensate for the effects of the variable friction force and some unpredictable disturbances, a novel backward error compensation (BEC) positioning control method integrated of the two driving modes and a double closed-loop PID controller system are proposed to obtain a high-accuracy positional motion. The experiment results demonstrate that the nanopositioning stage with large travel range of 300 mm × 300 mm has a fine speed characteristic and resolution is 5 nm. In the experiments of different travels up to 15 mm, calibrated by a commercial laser vibrometer, the positioning accuracy is proved within 55 nm in x-axis and 40 nm in y-axis with standard deviation less than 40 nm in x-axis and 30 nm in y-axis and the final position locking can be limited to 10 nm, meeting the requirements of micromanipulation technology.