Research Article
EGFET pH Sensor Performance Dependence on Sputtered TiO2 Sensing Membrane Deposition Temperature
Table 1
RF magnetron sputtering conditions of TiO2 thin films.
| | Parameters | Conditions 1 | Conditions 2 |
| | Substrate heating temperature (°C) | Room temperature | 200 | | RF power (W) | 300 | 300 | | Working pressure (mTorr) | 5 | 5 | | Gas flow rate (Ar : O2 sccm) | 50 : 1 | 50 : 1 | | Deposition time (min) | 5 | 5 |
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